Structural and electrical characterization of B-doped microcrystalline silicon thin films

Keyphrases

• C-Si 100%
• Boron Concentration 100%
• B-doped 100%
• Structural Characterization 100%
• Boron Doping 100%
• Microcrystalline Silicon Thin Film 100%
• Electrical Characterization 100%
• Electrical Properties 50%
• Structural Properties 50%
• Low Temperature 50%
• Hydrogen Bonds (H-bonds) 50%
• Amorphous Phase 50%
• Hydrogen Effusion 50%
• Crystalline Phase 50%
• Boron 50%
• Film Structure 50%
• Dark Conductivity 50%
• Hall Effect Measurement 50%
• Structural Change 50%
• Amorphization 50%
• PECVD Method 50%
• Conductive Film 50%
• Boron Incorporation 50%
• High Conductive 50%
• Multicrystalline Silicon 50%
• Bonding Environment 50%

Engineering

• Thin Films 100%
• Boron Concentration 100%
• Microcrystalline Silicon 100%
• Low-Temperature 50%
• Conductive 50%
• Crystalline Phase 50%
• Amorphous Phase 50%

Material Science

• Thin Films 100%
• Boron 100%
• Microcrystalline Silicon 100%
• Film 33%
• Crystalline Material 16%
• Amorphous Material 16%
• Hydrogen Bonding 16%
• Amorphization 16%
• Conductive Film 16%