Keyphrases
C-Si
100%
Boron Concentration
100%
B-doped
100%
Structural Characterization
100%
Boron Doping
100%
Microcrystalline Silicon Thin Film
100%
Electrical Characterization
100%
Electrical Properties
50%
Structural Properties
50%
Low Temperature
50%
Hydrogen Bonds (H-bonds)
50%
Amorphous Phase
50%
Hydrogen Effusion
50%
Crystalline Phase
50%
Boron
50%
Film Structure
50%
Dark Conductivity
50%
Hall Effect Measurement
50%
Structural Change
50%
Amorphization
50%
PECVD Method
50%
Conductive Film
50%
Boron Incorporation
50%
High Conductive
50%
Multicrystalline Silicon
50%
Bonding Environment
50%
INIS
silicon
100%
boron
100%
thin films
100%
doped materials
100%
films
50%
concentration
33%
hydrogen
33%
amorphous state
33%
chemical vapor deposition
16%
electrical properties
16%
effusion
16%
hall effect
16%
low temperature
16%
bonding
16%
environment
16%
Engineering
Thin Films
100%
Boron Concentration
100%
Microcrystalline Silicon
100%
Low-Temperature
50%
Conductive
50%
Crystalline Phase
50%
Amorphous Phase
50%
Material Science
Thin Films
100%
Boron
100%
Microcrystalline Silicon
100%
Film
33%
Hydrogen Bonding
16%
Amorphization
16%
Conductive Film
16%