Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

Ivandini Tribidasari Anggraningrum; Rika Sato; Yoshihiro Makide; Akira Fujishima; Yasuaki Einaga

doi:10.1016/j.diamond.2005.08.022

Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

Ivandini Tribidasari Anggraningrum, Rika Sato, Yoshihiro Makide, Akira Fujishima, Yasuaki Einaga

Department of Chemistry

Research output: Contribution to journal › Conference article › peer-review

48 Citations (Scopus)

Abstract

Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt²⁺ with a dose of 5 × 10¹⁴ cm^{- 2}. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.

Original language	English
Pages (from-to)	2133-2138
Number of pages	6
Journal	Diamond and Related Materials
Volume	14
Issue number	11-12
DOIs	https://doi.org/10.1016/j.diamond.2005.08.022
Publication status	Published - Nov 2005
Event	Proceedings of the 10th International Conference on New Diamond Science and Technology (ICNDST-10) ICNDST-10 Special Issue - Duration: 11 May 2005 → 14 May 2005

Keywords

Diamond electrodes
Electrochemical detection
Flow injection
Hydrogen peroxide
Ion implantation
Platinum

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10.1016/j.diamond.2005.08.022

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title = "Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide",

abstract = "Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt2+ with a dose of 5 × 1014 cm- 2. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.",

keywords = "Diamond electrodes, Electrochemical detection, Flow injection, Hydrogen peroxide, Ion implantation, Platinum",

author = "Anggraningrum, {Ivandini Tribidasari} and Rika Sato and Yoshihiro Makide and Akira Fujishima and Yasuaki Einaga",

year = "2005",

month = nov,

doi = "10.1016/j.diamond.2005.08.022",

language = "English",

volume = "14",

pages = "2133--2138",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier BV",

number = "11-12",

note = "Proceedings of the 10th International Conference on New Diamond Science and Technology (ICNDST-10) ICNDST-10 Special Issue ; Conference date: 11-05-2005 Through 14-05-2005",

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TY - JOUR

T1 - Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

AU - Anggraningrum, Ivandini Tribidasari

AU - Sato, Rika

AU - Makide, Yoshihiro

AU - Fujishima, Akira

AU - Einaga, Yasuaki

PY - 2005/11

Y1 - 2005/11

N2 - Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt2+ with a dose of 5 × 1014 cm- 2. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.

AB - Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt2+ with a dose of 5 × 1014 cm- 2. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.

KW - Diamond electrodes

KW - Electrochemical detection

KW - Flow injection

KW - Hydrogen peroxide

KW - Ion implantation

KW - Platinum

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U2 - 10.1016/j.diamond.2005.08.022

DO - 10.1016/j.diamond.2005.08.022

M3 - Conference article

AN - SCOPUS:27744561750

SN - 0925-9635

VL - 14

SP - 2133

EP - 2138

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 11-12

T2 - Proceedings of the 10th International Conference on New Diamond Science and Technology (ICNDST-10) ICNDST-10 Special Issue

Y2 - 11 May 2005 through 14 May 2005

ER -

Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

Abstract

Keywords

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