Microstructure characterization of amorphous silicon based alloys by inert gas effusion studies

W. Beyer, S. S. Camargo, Rosari Saleh

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

It is shown that inert gas effusion employing implanted neon and argon atoms is a useful tool for microstructure characterization of a-Si based alloys. The method measures sensitively interconnected voids and gives information about sizes of microstructure. Limitations of the method are discussed. The results show network reconstruction effects in a-Si:O:H and a-Si:C:H alloys as a function of annealing.

Original languageEnglish
Pages (from-to)A2341-A2346
JournalMaterials Research Society Symposium-Proceedings
Volume609
Publication statusPublished - 1 Jan 2000

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