Infrared and hydrogen effusion studies of amorphous silicon carbon (a-Si:C:H) films prepared by DC magnetron sputtering (DCMS)

Rosari Saleh, Lusitra Munisa, Wolfhard Beyer

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Abstract

Infrared and effusion of hydrogen, as well as of the inert gases, were studied for dc magnetron sputtered a-Si:C:H films. A structural transition from compact to void-rich material is observed and attributed to hydrogen-induced void formation. Inert gas atoms were incorporated into the material by ion implantation. It is shown that the inert gas effusion spectra give the information about sizes of microstructure.

Original languageEnglish
Pages (from-to)1110-1114
Number of pages5
JournalInternational Journal of Modern Physics B
Volume16
Issue number6-7
Publication statusPublished - 20 Mar 2002

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