TY - GEN
T1 - Formation of tio2 thin film on antibacterial metal injection molding stainless steel orthodontic bracket 17-4 ph using physical vapor deposition method
AU - Supriadi, Sugeng
AU - Ovilia, Annisa
AU - Ilmaniar, Nurul
AU - Suharno, Bambang
N1 - Publisher Copyright:
© 2020 Trans Tech Publications Ltd, Switzerland.
PY - 2020/1/1
Y1 - 2020/1/1
N2 - This study aims to equip orthodontic bracket SS 17-4 PH fabricated using metal injection molding with antibacterial properties. This can be achieved by applying TiO2 coating on the surface of brackets using magnetron sputtering PVD method. This method is chosen due to its compatibility to be used on bulk metal and its ability to control thin-film stoichiometry. Samples were prepared using the series of following steps which comprised of metal injection molding, binder elimination with solvent and thermal debinding, sintering in vacuum and argon atmosphere, electropolishing, and magnetron sputtering PVD coatings as the final stage. Negative bias, sputtering power, and partial pressure on vacuum chamber were set as the constant parameters. The atmosphere inside the PVD chamber was controlled using oxygen and argon gases. XRD and SEM observations were carried out to obtain the information on the phase and morphology of the films. Rutile and anatase crystalline structures with 2,27 nm and 9,78 nm crystal size were measured in as-deposited PVD TiO2 respectively. The deposition films were achieved in the range of 3 µm-8 µm.
AB - This study aims to equip orthodontic bracket SS 17-4 PH fabricated using metal injection molding with antibacterial properties. This can be achieved by applying TiO2 coating on the surface of brackets using magnetron sputtering PVD method. This method is chosen due to its compatibility to be used on bulk metal and its ability to control thin-film stoichiometry. Samples were prepared using the series of following steps which comprised of metal injection molding, binder elimination with solvent and thermal debinding, sintering in vacuum and argon atmosphere, electropolishing, and magnetron sputtering PVD coatings as the final stage. Negative bias, sputtering power, and partial pressure on vacuum chamber were set as the constant parameters. The atmosphere inside the PVD chamber was controlled using oxygen and argon gases. XRD and SEM observations were carried out to obtain the information on the phase and morphology of the films. Rutile and anatase crystalline structures with 2,27 nm and 9,78 nm crystal size were measured in as-deposited PVD TiO2 respectively. The deposition films were achieved in the range of 3 µm-8 µm.
KW - Magnetron sputtering PVD TiO
KW - Metal injection molding
KW - Orthodontic bracket
KW - Sintering atmosphere
KW - Stainless steel 17-4 precipitation hardening
UR - http://www.scopus.com/inward/record.url?scp=85087016539&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/KEM.846.169
DO - 10.4028/www.scientific.net/KEM.846.169
M3 - Conference contribution
AN - SCOPUS:85087016539
SN - 9783035716054
T3 - Key Engineering Materials
SP - 169
EP - 174
BT - Engineering and Innovative Materials VIII
A2 - Yahaya, Muhammad
A2 - Hsieh, Herng-Chia
PB - Trans Tech Publications Ltd
T2 - 8th International Conference on Engineering and Innovative Materials, ICEIM 2019
Y2 - 6 September 2019 through 8 September 2019
ER -