Effects of target density on structure and properties of sputtered indium tin oxide films

Badrul Munir, Younghee Jung, Rachmat A. Wibowo, Kyohoo Kim

Research output: Contribution to journalArticle

Abstract

Indium Tin Oxide (ITO) thin films were deposited from various target densities (98.7%~99.6%) using RF magnetron sputtering. Effect of the sputtering target densities on the structural, electrical and optical properties of deposited ITO thin films was investigated. The preferable (400) crystalline orientation peak was observed on the films deposited from < 99.0% target density. Higher target density produced films with higher roughness but lower resistivity. All of the deposited films showed optical transmittance more than 85% in the visible wavelength region. It is necessary to use the highest target for sputtering deposition of ITO thin films.
Original languageEnglish
Pages (from-to)157-162
Number of pages6
JournalInternational Journal of Nanoelectronics and Materials
Volume4
Publication statusPublished - 2011

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