Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films

Chairul Hudaya, Ji Hun Park, Joong Kee Lee

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance-metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

Original languageEnglish
Article number17
JournalNanoscale Research Letters
Volume7
Issue number1
DOIs
Publication statusPublished - 2012

Keywords

  • ECR-MOCVD
  • FTO
  • Process parameters
  • Sheet resistance uniformity
  • Thin film

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