Analysis and Modelling of the LPCVD Annular Reactor

Setijo Bismo, P. Duverneuil, L. Pibouleau, S. Domenech, J. P. Couderc

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


This paper presents the results of our work on a new type of CVD reactor, annular reactor. This equipment is able to deposit pure silicon and also in-situ phosphorus doped silicon on a large number of substrates.

Original languageEnglish
Pages (from-to)241-266
Number of pages26
JournalMaterials and Manufacturing Processes
Issue number2
Publication statusPublished - 1 Mar 1995


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